Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 83, Issue 3, Pages 341-346Publisher
SPRINGER
DOI: 10.1007/s00339-006-3502-7
Keywords
-
Ask authors/readers for more resources
We show that the mechanism of nanoparticle formation during femtosecond laser ablation of silicon is affected by the presence of a background gas. Femtosecond laser ablation of silicon in a H-2 or H2S background gas yields a mixture of crystalline and amorphous nanoparticles. The crystalline nanoparticles form via a thermal mechanism of nucleation and growth. The amorphous material has smaller features and forms at a higher cooling rate than the crystalline nanoparticles. The background gas also results in the suspension of plume material in the gas for extended periods, resulting in the formation (on a thin film carbon substrate) of unusual aggregated structures including nanoscale webs that span tears in the film. The presence of a background gas provides additional control of the structure and composition of the nanoparticles during short pulse laser ablation.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available