Fast growth of carbon nanowalls from pure methane using helicon plasma-enhanced chemical vapor deposition

Carbon nanowalls (CNWs) are synthesized under pure methane gas (CH4) using helicon plasma-enhanced chemical vapor deposition. CH4 in the helicon discharge is effectively dissociated to hydrogen atoms and hydrocarbon radicals, resulting in the formation of CNWs on a Ni substrate only from CH4. CNWs are grown up at a high growth rate of 18 mu m/h.