Journal
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
Volume 89, Issue 6, Pages 1876-1882Publisher
WILEY
DOI: 10.1111/j.1551-2916.2006.01048.x
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We report a process for preparing microdot arrays of SiO2 from a tetraethoxysilane precursor containing either a cationic (CTAB) or non-ionic surfactant. Controlling the ink jet deposition parameters and precursor hydrolysis made it possible to obtain mesoporous silica with a Pm3n cubic structure, using CTAB, or an Fmmm orthorhombic structure, using a non-ionic surfactant. The addition of hydrophobic organosilane F3C(CF2)(5)CH2CH2Si(OC2H5)(3) leads to the most regular and best-defined three-dimensional microdot array with a constant diameter of 155 mu m and a regular space of 250 mu m.
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