Journal
SURFACE SCIENCE
Volume 600, Issue 12, Pages 2518-2522Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.susc.2006.04.012
Keywords
pentacene; in-situ characterization; atomic force microscopy; near edge extended X-ray absorption fine structure (NEXAFS); surface structure, morphology, roughness and topography; silicon oxides; aromatics; thin film structures
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Molecular orientations of pentacene ultrathin films grown on SiO2 substrates were studied without the influence of the atmosphere by vacuum atomic force microscopy (V-AFM) and near edge X-ray absorption fine structure (NEXAFS). The experimental processes from deposition of pentacene to characterization of films were performed under vacuum condition without exposure to the atmosphere. V-AFM and NEXAFS measurements showed that pentacene molecules tend to grow on SiO2 surface with their molecular long axes perpendicular to the substrate surfaces (standing-mode) irrespective of preparation procedure of SiO2 substrate. (c) 2006 Elsevier B.V. All rights reserved.
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