Journal
MATERIALS RESEARCH BULLETIN
Volume 41, Issue 7, Pages 1392-1402Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.materresbull.2005.12.002
Keywords
microporous materials; X-ray diffraction; thermal expansion; phase transitions
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In situ high temperature X-ray diffraction (HTXRD) studies on monoclinic silicalite-1 (S-1, silica polymorph of ZSM-5) and an orthorhombic metallosilicate molecular sieve, zirconium silicalite-1 (ZrS-1) with MFI structure (Si/Zr = 50) have been carried out using a laboratory X-ray diffractometer with an Anton Parr HTK 1600 attachment. While the structure of the S-I collapsed at 1123 K forming alpha-cristobalite. S-1 and ZrS-1 showed a complex thermal expansion behavior in the temperature range 298-1023 K, ZrS-1 was stable. Powder X-ray diffraction (PXRD) data taken in this region have shown strong negative lattice thermal expansion coefficient, alpha(v) = -6.75 x 10(-6) and - 17.92 x 10(-6) K-1 in the temperature range 298-1023 K-1 for S-1 and ZrS-1 samples, respectively. The thermal expansion behavior of S-1 and ZrS-1 is anisotropic, with the relative strength of contraction along a axis is more than that along b and c axes. Three different thermal expansion regions could be identified in the overall temperature range (298-1023 K) studied, corroborating with the three steps of weight loss in the TG curve of ZrS-1 sample. While the region between 298 and 423 K, displays positive thermal expansion coefficient with alpha(v) = 2.647 x 10(-6) and 4.24 x 10(-6) K-1, the second region between 423 and 873 K shows strong negative thermal expansion (NTE) coefficient alpha(v) = -7.602 x 10(-6) and - 15.04 x 10(-6) K-1, respectively, for S-1 and ZrS-1 samples. The region between 873 and 1023 K, shows a very strong NTE coefficient with alpha(v) = - 12.08 x 10(-6) and -45.622 x 10(-6) K-1 for S-1 and ZrS-1, respectively, which is the highest in the whole temperature range studied. NTE seen over a temperature range 298-1023 K could be associated with transverse vibrations of bridging oxygen atoms in the structure which results in an apparent shortening of the Si-O distances. (C) 2006 Elsevier Ltd. All rights reserved.
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