Temperature-sensitive hydrogel pattern by electron-beam lithography

Cross-linking of water-soluble polymers by high-energy irradation provides a clean method for the synthesis of hydrogels. some applications of stimuli-sensistive polymers need different patterns in the micro- and submicrometer range on a supporting material. A dry layer of poly(vinyl methyl ether), on a Si-wafer was cross-linked and patterned by irradiation with the electron beam of a modified electron microscope. The patterns in the micro- and submicrometer range show good adhesion on the supporting material without adhesion promoter. The deformation and the elastic behavior of the pattern were tested by AFM. The formed gel structures were sensitive against changes in environmental condition. This offers a wide range of applications.