3.9 Article

Application of LTPL investigation methods to CVD-grown SiC

Journal

CHEMICAL VAPOR DEPOSITION
Volume 12, Issue 8-9, Pages 549-556

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/cvde.200606472

Keywords

3C-SiC; 4H-SiC; low-temperature photoluminescence; nitrogen and aluminum doping; secondary ion mass spectroscopy; silicon carbide

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We review in detail the few (simple) theoretical equations that rule all near-equilibrium recombination processes in semiconductors with direct or indirect bandgaps. In the case of 4H-SiC, we discuss their physical significance and show the corresponding limits. Next, we discuss the effect of residual doping in 3C-SiC and show that, from typical low-temperature photoluminescence (LTPL) data, very simple estimates of the doping level can be made. Finally, we focus on aluminum doping in 4H-SiC. Performing a systematic comparison of LTPL spectra with secondary ion mass spectroscopy (SIMS) and/or capacitance-voltage measurements, we show that a reasonably good value of the residual (or intentional) doping level can be obtained from simple optical measurements. An interesting point is that, in many cases, the use of such optical techniques offers the non-negligible advantage to allow detection beyond the SIMS limit.

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