4.8 Article

Atomic layer deposition of tungsten(III) oxide thin films from W2(NMe2)6 and water:: Precursor-based control of oxidation state in the thin film material

Journal

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
Volume 128, Issue 30, Pages 9638-9639

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/ja063272w

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