Journal
ADVANCED MATERIALS
Volume 18, Issue 19, Pages 2505-2521Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200502651
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Self-assembling block polymers can act as the building blocks of future advanced nanotechnologies based on bottorn-up fabrication methods. Top-down lithographic approaches offer arbitrary geometrical designs and superior nanometer-level precision, accuracy, and registration, as illustrated in the figure. By combining bottom-up, self-assembly with top-down patterned templates, templated-self-assembly (TSA) emerges as an innovative nanofabrication method.
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