Atmospheric pressure glow discharge CVD of Al2O3 thin films

We report for the first time deposition of aluminium oxide thin films by APGD plasma enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD and optical properties. It is demonstrated that the APCD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections.