Large-area long-range ordered anisotropic magnetic nanostructure fabrication by photolithography

In-plane anisotropic nanostructures have been fabricated using deep ultraviolet (UV) lithography. Dimensions from over 100 nm down to 50 nm with periods of 300 nm for a diamond shape and 159 nm for a triangular shape can be obtained using one mask by the over-exposure technique. Patterns transferred to a substrate to create magnetic films containing dots and antidots have been demonstrated. Hysteresis loop measurements proved higher coercivity for patterned films compared with continuous film.