Fabrication of highly ordered nanoporous alumina films by stable high-field anodization

Stable high-field anodization (1500-4000 A m(-2)) for the fabrication of highly ordered porous anodic alumina films has been realized in a H3PO4-H2O-C2H5OH system. By maintaining the self-ordering voltage and adjusting the anodizing current density, high-quality self-ordered alumina films with a controllable inter-pore distance over a large range are achieved. The high anodizing current densities lead to high-speed film growth (4-10 mu m min(-1)). The inter-pore distance is not solely dependent on the anodizing voltage, but is also influenced by the anodizing current density. This approach is simple and cost-effective, and is of great value for applications in diverse areas of nanotechnology.