Changes in photosystem II activity and leaf reflectance features of several subtropical woody plants under simulated SO2 treatment

The effects of simulated SO2 treatment on the photosynthetic apparatus were investigated in five subtropical forest plants, namely Pinus massoniana Lamb., Schima superba Gardn. et Champ., Castanopsis fissa (Champ. ex Benth.) Rehd. et Wils., Acmena acuminatissima (Bl.) Merr et Perry, and Cryptocarya concinna Hance. After leaf sections had been immersed in 0, 20, 50, and 100 mmol/L NaHSO3 for 20 h, total chlorophyll (Chl) content, Chl a/b, maximal photochemical efficiency, and the photochemical quantum yields of photo-system II of all five woody plants were reduced to different degrees, whereas lutein content (Chl base) was increased. Two protective mechanisms, namely the xanthophyll cycle (deepoxidation) and an anti-oxidant system (1,1-diphenyl-2-picrylhydrazyl radical-scavenging capacity), showed differences in the degree of modulation under simulated SO2 treatment. Compared with control (distilled water treatment), the revised normalized difference vegetation index, a leaf reflectance index, was lowered with increasing concentrations of NaHSO3. Cryptocarya concinna, a dominant species in the late succession stage of subtropical forests in South China, exhibited less sensitivity to NaHSO3. Conversely, Pinus massoniana, the pioneer heliophyte species, was most susceptible to NaHSO3 treatment. It is suggested that SO2 pollution may accelerate the succession of subtropical forest.