Journal
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
Volume 135, Issue 2, Pages 83-87Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.mseb.2006.08.031
Keywords
APCVD; N-doped TiO2; photocatalysis; hydrophilicity
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Using TiCl4, O-2, and NH3 as gas precursors, N-doped titanium dioxide films with large areas and continuous surfaces were deposited by atmospheric pressure chemical vapor deposition (APCVD). Measurements were performed by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM) and ultraviolet visible (UV-vis) transmission spectra. Using NH3 as the N-doping source, Ti4O7 is induced into the thin films, and anatase-rutile transformation is inhibited. Compared to pure TiO2, N-doped TiO2 films deposited with lower NH3 flows (< 90 sccm) give a relatively narrow band gap (from 3.21 to 2.76 eV), and their visible light-induced photocatalysis and hydrophilicity are much enhanced without a decrease in ultraviolet light activity. Preparation of N-doped TiO2 films by APCVD with low cost and high deposition rate (150 nm/min) is compatible with float glass processing, and has a potential industrial application. (c) 2006 Elsevier B.V. All rights reserved.
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