4.4 Article

Preparation of transparent CuCrO2:Mg/ZnO p-n junctions by pulsed laser deposition

Journal

THIN SOLID FILMS
Volume 515, Issue 4, Pages 2415-2418

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2006.05.023

Keywords

Mg-doped CuCrO2; ZnO; oxide semiconductor; transparent conducting oxide p-n junction

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Transparent p-n heterojunctions composed of zinc oxide, copper-chromium oxide, and indium tin oxide (ITO) films were fabricated by pulsed laser deposition (PLD) on glass substrates at temperatures as low as 500 degrees C. The rectifying characteristics were observed in the current-voltage curves of the prepared junctions. Undoped and Mg-doped CuCrO2 films were examined for their suitability as the p-type semiconductor layer for these junctions. A p-n junction with an n(+)-ZnO/n-ZnO/p-CuCrO2:Mg/ITO/glass structure exhibited the highest conductivity among all the samples. This 0.4-mu m-thick junction exhibited an optical transparency of greater than 80% in the visible range. (c) 2006 Elsevier B.V All rights reserved.

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