4.4 Article

Defect structure and optical damage resistance of In:Mg:Fe:Li/NbO3 crystals with various Li/Nb ratios

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 297, Issue 1, Pages 199-203

Publisher

ELSEVIER
DOI: 10.1016/j.jcrysgro.2006.08.050

Keywords

Czochralski method; lithium compound; photo-refracitve materials

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In:Mg:Fe:LiNbO3 crystals were grown by the Czochralski technique with various ratios of Li/Nb = 0.85, 0.94, 1.05, 1.20 and 1.38 in the melt. The crystal composition and defect structure were analyzed by the UV-vis and IR spectroscopy. A new narrow OH-associated vibrational peak at 3518 cm(-1) was revealed in In:Mg:Fe:LiNbO3 crystals with the ratio of Li/Nb = 1.38. It was attributed to a (In-Nb)(2-)-OH--(Mg-Nb)(3-) defect center. The optical damage resistance of In:Mg:Fe:LiNbO3 crystals was studied by the transmitted beam pattern distortion method. The results show that when both the In2O3 threshold and the In-Mg threshold concentrations are reached, as for the Li/Nb ratio of 1.38, the optical damage resistance of In:Mg:Fe:LiNbO3 crystals is the highest. (c) 2006 Published by Elsevier B.V.

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