Journal
APPLIED PHYSICS LETTERS
Volume 90, Issue 8, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.2396891
Keywords
-
Categories
Ask authors/readers for more resources
In this letter, the authors report on the material and electrical characterizations of high dielectric constant (k) oxide HfTiAlO for the next generation of complementary metal-oxide semiconductors. Crystallization temperature has been improved to 800-900 degrees C versus that of HfO2. The substitution of Ti and Al in the HfO2 cubic structure results in an increased dielectric constant and an acceptable barrier height. The extracted dielectric constant is 36, and the band offset relative to the Si conduction band is 1.3 eV. An equivalent oxide thickness of 11 A and low leakage have been achieved with good interfacial properties. (c) 2007 American Institute of Physics.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available