☆ 4.2 Article

Detailed analysis of the influence of an inductively coupled plasma reactive-ion etching process on the hole depth and shape of photonic crystals in InP/InGaAsP

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2007)

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Detailed analysis of the influence of an inductively coupled plasma reactive-ion etching process on the hole depth and shape of photonic crystals in InP/InGaAsP

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