Journal
JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS
Volume 16, Issue 1, Pages 59-73Publisher
WORLD SCIENTIFIC PUBL CO PTE LTD
DOI: 10.1142/S021886350700355X
Keywords
two-photon stereolithography; submicro resolution; voxels; radical quencher; oxygen plasma ashing
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Two-photon stereolithography based on photopolymerization provides the ability to fabricate real three-dimensional (3D) microstructures beyond the resolution of focal size. In this paper, our recent research focusing on improvement of spatial resolution in two-photon stereolithography is reviewed. The influence of system and fabrication conditions in relation to the spatial resolution is discussed. For small and low aspect ratio voxels, a minimum power and minimum exposure time (MPMT) scheme is introduced. During the two-photon process, an ascending technique, wherein the truncation amount of volumetric pixels is controlled, can be applied to improve the resolution of two-dimensional patterns. 3D Microfabrication with less than 100 nm resolution can be realized by using the radical quenching effect. After the two-photon process, the resolution of fabricated patterns can be refined to 60 nm by post-processing of plasma ashing.
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