Journal
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
Volume 48, Issue 19, Pages 3394-3396Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/anie.200805687
Keywords
block copolymers; lithography; molecular recognition; self-assembly; semiconductors
Categories
Funding
- National Creative Research Initiative Program of the Korean Ministry of Education, Science, and Technology