Journal
PLASMA PROCESSES AND POLYMERS
Volume 4, Issue -, Pages S878-S881Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.200732103
Keywords
low-pressure discharges; optical properties; plastics; self-organization; surface morphology
Ask authors/readers for more resources
Stochastic subwavelength structures on polymethylmetacrylate (PMMA) surfaces were produced by low-pressure argon/oxygen plasma treatment. The modified surfaces show antireflective properties exhibiting low scattering losses depending on the size and the density of the structure. It is demonstrated that the antireflection performance is a function of the mean ion energy and working pressure that are controllable by process parameters, namely plasma power and gas flow. A model is suggested that assumes a self-assembling etch mask as reason for the growth of the pins with about 70-90 nm in lateral dimension and up to 600 nm in height.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available