Journal
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
Volume 297, Issue 1-3, Pages 221-239Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.colsurfa.2006.10.049
Keywords
humic acid; SAMs; ATR-FTIR; AFM; TOF-SIMS
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In this paper, we report on the covalent attachment of humic acids on silicon wafers. Monolayers of 11-amino-undecylsiloxane were prepared on silicon wafers by substitution of 11-bromo-undecylsiloxane with an azido group followed by a subsequent reduction. These substrates were coupled with humic acids via a diazotization procedure. Characterization of the functionalized surfaces was performed by different methods: ATR-FTIR, ellipsometry, AFM, TOF-SIMS and amino groups surface density was monitored by UV spectroscopy. These different methods confirmed the immobilization of humic acids on the substrates, consisting in a very useful tool for environmental applications, in particular, for determination of complexation constants between immobilized humic acid moiety and radionuclides. These miniaturized solid state system could be used as a sensitive detector for trace elements in fluid solutions or lixiviation studies in the framework of radionuclide dissemination and modelling studies from radioactive storage. (c) 2006 Elsevier B.V. All rights reserved.
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