4.4 Article Proceedings Paper

Sub-5 nm FIB direct patterning of nanodevices

Journal

MICROELECTRONIC ENGINEERING
Volume 84, Issue 5-8, Pages 779-783

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2007.01.059

Keywords

focused ion beam; selective epitaxy; quantum dots

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Nanoengraving of membranes as a template for nanopores fabrication is an application field of growing interest. Similarly to the formation of ion tracks in membranes created when high-energetic ions pass trough thin foils, it is possible with a FIB system to fabricate, design and organise nanodevices within thin membranes. In this work, we detail the advanced methodology we have carefully optimised for such deep sub-10 nm nanodevices fabrication using our high-performance FIB instrument. (c) 2007 Elsevier B.V. All rights reserved.

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