Journal
PLASMA SOURCES SCIENCE & TECHNOLOGY
Volume 16, Issue 2, Pages 399-412Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0963-0252/16/2/025
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We use a global (volume averaged) model to study the dissociation processes and the presence of negative ions and metastable species in a low pressure high density O-2/Ar discharge in the pressure range 1-100mTorr. The electron density and the fractional dissociation of the oxygen molecule increases with increased argon content in the discharge. We relate this increase in fractional dissociation to an increase in the reaction rate for electron impact dissociation of the oxygen molecule which is due to the increased electron temperature with increased argon content in the discharge. The electron temperature increases due to higher ionization potential of argon than for molecular and atomic oxygen. We find the contribution of dissociation by quenching of the argon metastable Arm by molecular oxygen (Penning dissociation) to the creation of atomic oxygen to be negligible. The negative oxygen ion O- is found to be the dominant negative ion in the discharge. Dissociative attachment of the oxygen molecule in the ground state O-2(X-3 Sigma(-)(g)) and in particular the metastable oxygen molecule O-2(a(1)Delta(g)) are the dominating channels for creation of the negative oxygen ion O-.
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