Journal
MICROELECTRONIC ENGINEERING
Volume 84, Issue 5-8, Pages 925-927Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2007.01.081
Keywords
nanoimprint lithography; alignment; Moire
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Nanoimprint lithography (NIL) is a cost efficient technique for the mass production of nanostructures. We demonstrate alignment accuracies in the range of 100 nm and below in UV-based nanoimprint lithography (UV-NIL) using a simple optical technique. The advantages of this technique are the relative simplicity of the marker-design and the whole setup combined with the possibility of an upgrade of existing equipment and still ultra-high precision alignment capabilities. (c) 2007 Elsevier B.V. All rights reserved.
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