Journal
SURFACE & COATINGS TECHNOLOGY
Volume 201, Issue 16-17, Pages 7207-7215Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2007.01.028
Keywords
flourination of polymers; plasma; CVD
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Fluorination of PMMA using atmospheric plasmas is highly dependent on the nature of the fluorinating agents and plasma parameters. For example, application of nitrogen plasma to the PMMA leads to surface etching and a decrease of the water contact angle to 57 degrees. With addition of the SF6 to the plasma the etching process is enhanced. Hexafluorosulfide etching is also inhomogeneous along the surface of PMMA where nanocolumns formation was observed by atomic force microscopy. In contrast, deposition of fluorocarbon polymer onto PMMA can be accomplished via exposure to hexafluoropropylene (HFP) plasma, resulting in an increased water contact angle of PMMA from 70 degrees to 110 degrees. The standard deviation of the water contact measurements varied from 0.5 to 6 degrees suggesting homogeneous nature of the poly HFP coatings. RMS roughnesses of 0.6 to 0.9 nm were measured for poly HFP films on PMMA deposited by atmospheric pressure plasma discharge system. (C) 2007 Elsevier B.V. All rights reserved.
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