Journal
FUEL PROCESSING TECHNOLOGY
Volume 88, Issue 6, Pages 599-605Publisher
ELSEVIER
DOI: 10.1016/j.fuproc.2007.01.009
Keywords
carbon molecular sieve; chemical vapor deposition; activated carbon; methane
Ask authors/readers for more resources
Palm shell based activated carbon prepared by K-2-CO3 activation is used as precursor in the production of carbon molecular sieve by chemical vapor deposition (CVD) method using benzene as depositing agent. The influences of deposition temperature, time, and flow rate of benzene on pore development of carbon molecular sieve (CMS) and methane (CH4) adsorption capacity were investigated. The parameters that varied are the deposition temperature range of 600 to 1000 degrees C, time from 5.0 to 60 min, and benzene flow rate from 3.0 to 15 mL/min. The results show that in all cases, increasing the deposition temperature, time, and flow rate of benzene result in a decrease in adsorption capacity of N-2, pore volume and pore diameter of CMS. The BET surface area of CMS (approximately 1065 m(2)/g) and the adsorption capacity of CH4 were at a maximum value at a deposition temperature of 800 degrees C, time of 20 min and benzene flow rate of 6 mL/min. The product has a good selectivity for separating CH4 from carbon dioxide (CO2), nitrogen (N-2) and oxygen (O-2) (C) 2007 Elsevier B.V All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available