Journal
SURFACE SCIENCE
Volume 601, Issue 13, Pages 2611-2614Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.susc.2006.12.017
Keywords
block copolymer; self-assembly; etching; defects; nanostructures
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Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. Thin phenomenon was studied for an asymmetric poly(styrene-block-methyl methacrylate) (PS-b-PMMA) diblock copolymer with PMMA weight fraction of 0.3 and MW = 67,100 g mol(-1). First, the surface chemistry of the substrate was modified to favor the formation of vertical PMMA cylinders surrounded by a PS matrix. We have also found that the mean pore area of cylinders increases with their coordination number. Finally, these films were used as a deposition or etching mask to produce well-organized arrays of holes. dots and nanopillars. (C) 2007 Elsevier B.V. All rights reserved.
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