4.7 Article

Vibrational behavior of a realistic amorphous-silicon model

Journal

JOURNAL OF NON-CRYSTALLINE SOLIDS
Volume 353, Issue 22-23, Pages 2272-2279

Publisher

ELSEVIER
DOI: 10.1016/j.jnoncrysol.2007.02.039

Keywords

phonons; silicon; molecular dynamics

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The vibrational properties of a high-quality realistic model of amorphous silicon are examined. The longitudinal and transverse dynamical structure factors are calculated, and fitted to a damped harmonic oscillator (DHO) function. The width F of the best-fit DHO to the longitudinal dynamical structure factor scales approximately as k(2) for wavevectors k less than or similar to 0.55 angstrom(-1), which is above the loffe-Regel crossover frequency separating the propagating and diffusing regimes, occurring at k = 0.38 +/- 0.03 angstrom(-1). Using the DHO function as a fitting function for the transverse dynamical structure factor (without theoretical justification), gives a dependence of Gamma alpha k(alpha) with alpha similar to 2.5 for wavevectors k less than or similar to 0.7 angstrom(- 1). There was no evidence for Gamma alpha k(4) behavior for either polarization. (c) 2007 Elsevier B.V. All rights reserved.

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