Journal
SURFACE & COATINGS TECHNOLOGY
Volume 201, Issue 22-23, Pages 8838-8841Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2007.04.102
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The chemical vapor deposition (CVD) of thin TiO2 films was studied on the macroscale level using a computational fluid model. The deposition rate was established for various substrate temperatures, showing the transition from a surface reaction rate limited regime to a mass limited regime. (c) 2007 Elsevier B.V. All rights reserved.
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