Journal
MICROELECTRONIC ENGINEERING
Volume 84, Issue 11, Pages 2501-2505Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2007.05.024
Keywords
carbon nanotubes (CNT); plasma enhanced chemical vapor deposition (PECVD); electrochemical deposition (ECD)
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This article reports on carbon nanotubes (CNT) grown on TiN/Cu stacks by plasma enhanced chemical vapor deposition (PECVD) at 450 degrees C. Ni catalyst was deposited by two techniques - physical vapor deposition (PVD) and electrochemical deposition (ECD). First, the influence of the catalyst thickness and the catalyst deposition technique on grown CNTs is investigated. Second, the enhancement of the CNTs growth by use of electrodeposited catalysts is emphasized. (C) 2007 Published by Elsevier B.V.
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