Direct patterning, Conformal coating, and erbium doping of luminescent nc-Si/SiO2 thin films from solution processable hydrogen silsesquioxane

Hydrogen silsesquioxane is used as a solution-borne molecular precursor in the fabrication of highly luminescent thin films of SiO2 containing silicon nanocrystals. Films are readily formed on non-flat substrates (e.g., optical fibers) and patterned using e-beam lithography (see figure).