Journal
JOURNAL OF MATERIALS RESEARCH
Volume 22, Issue 12, Pages 3338-3343Publisher
MATERIALS RESEARCH SOC
DOI: 10.1557/JMR.2007.0437
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CuAlO2 thin films with (015) preferential orientation growth have been synthesized on quartz substrates using radio frequency (rf) magnetron sputtering at low temperature. Via the optimized postannealing condition (in N-2 preserved ambient at 900 degrees C for 5 h), the preferential orientation of the films changes from (015) to (001) direction. The use of a higher conductivity at the ab plane of CuAlO2 compared with that along the c axis, reduces the resistivity of the film at room temperature to 37 Omega.cm from that of the as-deposited, 4.62 x 10(4) Omega.cm. The positive Hall coefficient (+183.6 cm(3)/C) and the large mobility (4.07 cm(2)/V.s) suggest that CuAlO2 thin films are p-type semiconductors with good conduction path. The temperature dependence of conductivity indicates that CuAlO2 thin films obey a thermal-activation theory when the temperature is above 190 K, but below 185 K a two-dimension variable-range hopping mechanism becomes dominant.
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