Journal
ADVANCED MATERIALS
Volume 19, Issue 24, Pages 4375-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200701163
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A method for producing self-organised arrays of nanometric metallic dots is reported. It consists on developing first the nanodot pattern by ion erosion on a semiconductor cover film and transferring it to a previously buried metallic layer. This procedure has been applied to Co, and the ferromagnetic behaviour of the dots at room temperature is demonstrated. [GRAPHICS]
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