Rapid fabrication of high aspect ratio silicon nanopillars for chemical analysis

In this study, a method for fabrication of high aspect ratio silicon nanopillars is presented. The method combines liquid flame spray production of silica nanoparticle agglomerates with cryogenic deep reactive ion etching. First, the nanoparticle agglomerates, having a diameter of about 100 nm, are deposited on a silicon wafer. Then, during the subsequent cryogenic deep reactive ion etching process, the particle agglomerates act as etch masks and silicon nanopillars are formed. Aspect ratios of up to 20:1 are demonstrated. The masking process is rapid, cheap and has the potential to be scaled up for large areas. Three other structured silicon surfaces were fabricated for comparison. All four surfaces were utilized as desorption/ionization on silicon (DIOS) sample plates. The mass spectrometry results indicate that nanopillar surfaces masked with the liquid flame spray technique are well suited as DIOS sample plates.