Journal
INTERNATIONAL JOURNAL OF HYDROGEN ENERGY
Volume 40, Issue 12, Pages 4311-4319Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.ijhydene.2015.01.085
Keywords
Bismuth vanadate; Hydrogen treatment; Photoelectrochemical; rf-sputtering
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Funding
- Department of Science and Technology
- Department of Electronics and Information Technology, Govt. of India
- Department of Science & Technology, New Delhi, India
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In the present study structural, optical and electronic properties of bismuth vanadate (BiVO4) thin films prepared by rf-sputtering technique were modified by post-hydrogen treatment to improve the photoelectrochemical (PEC) performance for water oxidation. X-ray diffraction and Raman analysis do not reveal any major structural changes but show increase in crystallite size and creation of defect states, however, optical absorption studies shows changes in band gap energy values due to the creation of inter-band states on hydrogen treatment. X-ray photoelectron spectroscopy studies show that the hydrogen treatment reduces surface Bi4+ considerably and increases the density of hydroxyl groups on the BiVO4 surface. The combined effect of these changes manifests in terms of enhanced photocurrent density of 3.31 mA/cm(2) (at applied potential 1.0 V versus Ag/AgCl), which is about nine time higher than the pristine BiVO4 and reduced photocurrent onset potential. Copyright (C) 2015, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights reserved.
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