4.7 Article

Advances in top-down and bottom-up surface nanofabrication: Techniques, applications & future prospects

Journal

ADVANCES IN COLLOID AND INTERFACE SCIENCE
Volume 170, Issue 1-2, Pages 2-27

Publisher

ELSEVIER
DOI: 10.1016/j.cis.2011.11.001

Keywords

Nanofabrication; Lithography; Self assembly; Vapor phase deposition; Nanocomposites

Funding

  1. center for Nano Science and Technology (NDnano)

Ask authors/readers for more resources

This review highlights the most significant advances of the nanofabrication techniques reported over the past decade with a particular focus on the approaches tailored towards the fabrication of functional nano-devices. The review is divided into two sections: top-down and bottom-up nanofabrication. Under the classification of top-down, special attention is given to technical reports that demonstrate multi-directional patterning capabilities less than or equal to 100 nm. These include recent advances in lithographic techniques, such as optical, electron beam, soft, nanoimprint, scanning probe, and block copolymer lithography. Bottom-up nanofabrication techniques such as, atomic layer deposition, sol-gel nanofabrication, molecular self-assembly, vapor-phase deposition and DNA-scaffolding for nanoelectronics-are also discussed. Specifically. we describe advances in the fabrication of functional nanocomposites and graphene using chemical and physical vapor deposition. Our aim is to provide a comprehensive platform for prominent nanofabrication tools and techniques in order to facilitate the development of new or hybrid nanofabrication techniques leading to novel and efficient functional nanostructured devices. (C) 2011 Elsevier B.V. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.7
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available