Journal
ADVANCED MATERIALS
Volume 25, Issue 6, Pages 904-909Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201204141
Keywords
stimulated emission depletion (STED); reversible saturable optical fluorescence transition (RESOLFT); isopropyl thioxanthone (ITX); 7-diethylamino-3-thenoylcoumarin (DETC); photoinduced absorption
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The diffraction limit in direct-laser-writing (DLW) lithography can be circumvented by selective inhibition of the polymerization. By combining nanosecond transient absorption spectroscopy and density functional theory it is demonstrated that polymerization inhibition is possible by a direct absorption of the lowest triplet state. Polymerization inhibition by triplet state absorption (TSA) has the potential to bring DLW lithography into the nanometer scale.
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