Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early

ADVANCED MATERIALS

Volume 24, Issue 19, Pages 2608-2613

WILEY-V C H VERLAG GMBH

lithography; semiconductors; patterning; resists; sequential infiltration synthesis (SIS)

Chemistry, Multidisciplinary Chemistry, Physical Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Physics, Condensed Matter

1. U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences [DE-AC02-06CH11357, DE-SC0001059]
2. Argonne-Northwestern Solar Energy Research Center, an Energy Frontier Research Center