4.8 Article

Initiated Chemical Vapor Deposition-Based Method for Patterning Polymer and Metal Microstructures on Curved Substrates

Journal

ADVANCED MATERIALS
Volume 24, Issue 48, Pages 6445-6450

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201201975

Keywords

chemical vapor deposition; thin films; patterning; curved substrates; multifunctional surfaces

Funding

  1. MIT Institute for Soldier Nanotechnologies (ISN) [DAAD-19-02D-0002]
  2. U.S. Army Research Office
  3. National Science Foundation

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A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces.

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