Journal
ADVANCED MATERIALS
Volume 23, Issue 17, Pages 1977-1981Publisher
WILEY-BLACKWELL
DOI: 10.1002/adma.201100323
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Funding
- National Science Foundation [CBET 0933828]
- National Institutes of Health, NIDCR [DE 10959]
- Directorate For Engineering
- Div Of Chem, Bioeng, Env, & Transp Sys [0933828] Funding Source: National Science Foundation
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Photopatterning of a photoreversible covalent elastomeric network under mechanical :train, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.
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