Journal
ADVANCED MATERIALS
Volume 23, Issue 27, Pages 3061-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201100633
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Funding
- Institute of Physics (IOP)
- Chinese Academy of Sciences (CAS)
- Science Foundation of CAS
- National Science Foundation of China (NSFC)
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A top-down approach for controlled tailoring of graphene nanostructures with zigzag edges is presented. It consists of two key steps: artificial defect patterning and hydrogen-plasma etching. With this approach, various graphene nanostructures with sub-10 nm features and identical zigzag edges are reliably achieved. This approach shows great promise for making future graphene devices or circuits.
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