Journal
ADVANCED MATERIALS
Volume 23, Issue 10, Pages 1246-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201003847
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Funding
- NSF [50702074, 20973195]
- MOST of China [2009DFA01290, 2007CB936203, 2007AA03Z353]
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An innovative approach for the high-throughput, rapid, and low-cost fabrication of ultranarrow graphene nanoribbons (GNRs) using nanosphere lithography (NSL) nanopatterning in combination with low-power O-2 plasma etching is presented. The intrinsic simplicity of NSL patterning enables this fabrication approach to be applicable for the straightforward on-chip fabrication of GNRs and bandgap tuning of graphene.
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