4.8 Article

Conformable Solid-Index Phase Masks Composed of High-Aspect-Ratio Micropillar Arrays and Their Application to 3D Nanopatterning

Journal

ADVANCED MATERIALS
Volume 23, Issue 7, Pages 860-+

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201003885

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Funding

  1. Center for Nanoscale Mechatronics Manufacturing
  2. Ministry of Education, Science and Technology, KOREA
  3. Low Observable Technology Research Center of the Defense Acquisition Program Administration and Agency for Defense Developmen
  4. National Research Foundation of Korea [2008-2006612] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Defect-free and dense micropillar arrays with a high aspect ratio are replicated from etched Si masters using high-modulus polyurethane acrylate. The newly designed conformable solid-index mask can generate high-resolution 3D nanostructures that can be patterned through proximity field nanopatterning (PnP) in a single exposure step. The superb optical property proves the quality of 3D nanostructures.

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