4.2 Article

Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 28, Issue 2, Pages 401-406

Publisher

A V S AMER INST PHYSICS
DOI: 10.1116/1.3273895

Keywords

elemental semiconductors; indentation; molecular dynamics method; nanocontacts; nanoelectromechanical devices; plastic deformation; Raman spectra; semiconductor doping; silicon

Funding

  1. Australian Research Council

Ask authors/readers for more resources

Within this paper, the authors propose a refined high vacuum scanning spreading resistance microscopy (HV-SSRM) electromechanical nanocontact model based on experimental results as well as molecular dynamics (MD) simulation results. The formation under the tip of a nanometer-sized pocket of beta-tin, a metastable metalliclike phase of silicon (also named Si-II), acting as a virtual probe is demonstrated. This gives a reasonable explanation for the superior SSRM spatial resolution as well as for the electrical properties at the Schottky-like SSRM contact. Moreover, the impact of the doping concentration on the plastic deformation of silicon for different species using micro-Raman combined with indentation experiments is studied. In order to elucidate the superior results of SSRM measurements when performed under high vacuum conditions, the impact of humidity on the mechanical deformation and Si-II formation is also analyzed using MD and SSRM experimental results.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.2
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available