Journal
ADVANCED MATERIALS
Volume 23, Issue 13, Pages 1558-1562Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201004161
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Funding
- UK Engineering and Physical Sciences Research Council (EPSRC) [EP/F023200, EP/F061757]
- Royal Society
- Research Councils UK (RCUK)
- Center for Advanced Structural Ceramics (CASC) at Imperial College London
- Engineering and Physical Sciences Research Council [EP/F061757/1] Funding Source: researchfish
- EPSRC [EP/F061757/1] Funding Source: UKRI
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Interlayer lithography is used to pattern highly conductive, solution-processed, reduced graphene oxide source and drain electrodes down to 10 mu m gaps. These patterned electrodes allow the fabrication of high-performance organic thin-film transistors and complementary circuits. The method offers a viable route towards organic electronics fabricated entirely by solution processing.
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