4.8 Article

Deterministic Nanotexturing by Directional Photofluidization Lithography

Journal

ADVANCED MATERIALS
Volume 23, Issue 29, Pages 3244-+

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201100662

Keywords

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Funding

  1. Center for Nanostructured Materials Technology [2011K000217]
  2. Ministry of Education, Science, and Technology of Korea
  3. Brain Korea 21 Program
  4. WCU at KAIST
  5. Korea Science and Engineering Foundation [S2-2008-000-018551]

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Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nano fabrication methods, which allows the manipulation of the photonic and interface properties of nanotextured surfaces.

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