4.8 Article

Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers

Journal

ADVANCED MATERIALS
Volume 22, Issue 45, Pages 5129-+

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201002465

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Funding

  1. U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences [DE-AC02-06CH11357, DE-SC0001785]

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Selective self-limited interaction of metal precursors with self-assembled block copolymer substrates, combined with the unique molecular-level management of reactions enabled by the atomic layer deposition process, is presented as a promising controllable way to synthesize patterned nanomaterials (e.g., Al2O3 see Figure, TiO2, etc.) with uniform and tunable dimensions.

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