Journal
ADVANCED MATERIALS
Volume 22, Issue 32, Pages 3578-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201000892
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Funding
- Deutsche Forschungsgemeinschaft (DFG) [DFG-Fr 1671/4-3]
- State of Baden-Wurttemberg through the DFG-Center for Functional Nanostructures (CFN) [A1.4]
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Using a novel photoresist (composed of pentaerythritol triacrylate and isopropyl thioxanthone) that favors stimulated emission depletion by a pi-pi* transition and using a two-color two-photon excitation scheme, 65-nm wide lines are achieved. This value is limited by parasitic two-photon absorption of the continuous-wave depletion beam. It is estimated that, without this process, line widths of 30 nm are in reach.
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