Journal
ADVANCED MATERIALS
Volume 22, Issue 48, Pages 5512-5516Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201002397
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Funding
- Ministry of Education, Science and Technology(MEST) [2009-0080344, 2010-0014925, 2010-0015014]
- NRF/MEST [R11-2005-048-00000-0]
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A novel device structure is presented for amorphous oxide semiconductor thin-film transistors with high performance as well as improved electrical/optical stress stability. The highly stable transistor devices are developed using composition-modulated dual active layers. This approach could potentially be used to fabricate product-level display devices using amorphous oxide semiconductors in the near future.
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